Engineered Coatings maintains two state-of-the-art physical vapor deposition (PVD) coating systems and one newly developed atmospheric plasma (AP) deposition system. The two PVD systems that employ the latest developments in bias-assisted unbalanced magnetron sputtering technology. One system incorporates a unique method (licensed from Southwest Research Institute) to increase the plasma density, which significantly enhances ion bombardment during film growth, resulting in excellent coating properties. With these unique deposition methods, we are able to deposit thin films with exceptional properties, including excellent adhesion and density, corrosion-resistance and abrasion/erosion-resistance. Our coating systems can fabricate both co-deposited multicomponent films as well as multilayer architectures. We have experience with deposition of nanocomposites, hard ceramics/cermets, metals, and quasicrystalline materials. Recently ECI has added a unique atmospheric plasma deposition system (plasma-enhanced chemical vapor deposition(CVD)), which incorporates a RF plasma head, liquid precursor bubblers, and a 3-axis robot for plasma head translation.